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AZ 9245

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AZ 9245 Processing Guidelines

Process for 6 µm thick AZ 9245 photoresist thickness

  1. Dehydration Bake: 110 ˚C for 30 mins
  2. HMDS: 5 mins (not needed if coating PR on top of polyimide)
  3. Spin speed: Spread – 1700 RPM / 500 RPM/s / 5 sec, spin speed – 2200 RPM / 1000 RPM/s / 25 sec
  4. Soft Bake: 110 ˚C for 90 seconds on hot plate
  5. Exposure time: 45 sec
  6. Development: 1:3 (DI water : AZ 400 K) for 1 min 30 seconds
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